Current Openings

Description:
The successful candidate will join a world-class team of algorithm and software engineers to conceive, implement, optimize, and document advanced algorithms and software modules used in SEM Wafer / Mask inspection systems. This individual will utilize his/her skills and knowledge in signal/image processing/computer geometry/pattern recognition to design algorithm and software on a Windows platform and Linux platform. He/She should be an effective team player and be able to smoothly cooperate with other team members. The successful candidate should be creative, results and detail oriented, be able to pick up the existing algorithms quickly, optimize and create new algorithms in the fields of computer geometry and GDS/OASIS layout design analysis.

Requirement:
- MS/PhD in EE/CS or equivalent, 3+ yr hands-on exp in parallel computing optimization, high performance computing and algorithm design;
- Strong background in GDS/OASIS Layout Design Analysis and Computer Geometry, with experience in design risk analysis is a plus;
- Solid experience in C#, C/C++ programming;
- Experience in Geographic information system (GIS) and pattern search is essential;
- Knowledge in computer architecture or familiar with semiconductor equipment development is plus.

To apply for this position please submit an MS Word doc of your resume and put in the subject "Job ID # 1790".